Category Archives: Wet process

al2o3 Etch and al2o3 Wet Etch Trend for Semiconductor

Posted on June 13, 2013 by roynetedge

The use semiconductor materials such as silicon in the industry has become more and more popular today, particularly in the production of InGaN-based light-emitting diode. InGan or Indium Gallium Nitride is the light emitting layer you see in modern blue … Continue reading →

Posted in Wet process | Tagged , , , , | Leave a comment

Key benefits of IPA vapor dryer

Posted on August 7, 2012 by roynetedge

IPA vapor dryer a.k.a. Marangoni dryer is an equipment used in the wet process and is popular because it provides an ‘extremely clean drying process,’ which relies on surface-tension gradient forces called marangoni stresses. This tool is very useful to … Continue reading →

Posted in Wet process | Tagged , | Leave a comment